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METHOD FOR PRODUCING LUMINESCENT BISMUTH-CONTAINING QUARTZOID MATERIAL BASED ON HIGH SILICA POROUS GLASS

机译:基于高二氧化硅多孔玻璃的发光含铋石英晶体材料的制备方法

摘要

1. A method for producing bismuth-containing quartzoid glass based on high-silica porous glass obtained by heat treatment of sodium borosilicate glass, holding two-phase glass in a 3 M HNO solution during boiling, multi-stage washing in distilled water and combined drying in air at a temperature of 20 ÷ 120 ° C, characterized in that a 0.5 M solution of Bi (NO) bismuth nitrate prepared on the basis of an aqueous 2 M solution is introduced into the pore space of the NPS matrices three times for 24 hours at a temperature of (22 ± 2) ° C HNO, between impregnations and at the end, samples are dried at 30-65 ° C for 40-60 minutes, then the obtained impregnated and dried samples are heat-treated in an air atmosphere in an electric furnace, and the samples are placed on a substrate of high-purity quartz glass and carry out heating for 5 min using an oxygen-hydrogen burner, which is fed from the side of the quartz substrate. 2. The method according to claim 1, characterized in that the samples are impregnated in 0.01-0.05 M Bi (NO) solutions prepared on the basis of a 2 M HNO solution; 3. The method according to claim 1, characterized in that the heat treatment is carried out at temperatures from room temperature to ~ 900 ° C with a heating rate of 1-4 deg / min, and then at temperatures ≥1500 ° C; 4. The method according to claim 1, characterized in that the heat treatment is carried out according to a multi-stage temperature-time regime from room temperature to ≥1500 ° C, while in the first stage, the heat treatment is carried out from room temperature (18 ± 2 ° C) to 115 ± 2 ° C with a heating rate of 3-4 deg / min and a shutter speed of 30 min; in the second stage, heat treatment is carried out from 115 ± 2 ° C ° C to 420 ± 2 ° C with a heating speed of 1-2 grad / min and a shutter speed of 60 min, in the third stage, heat treatment is carried out from 420 ± 2 ° C to 565 ± 2 ° C with
机译:1.一种基于高硅石多孔玻璃的含铋石英玻璃的制造方法,所述高硅石多孔玻璃是通过对硼硅酸钠玻璃进行热处理,将两相玻璃在沸腾期间保持在3M HNO溶液中,在蒸馏水中进行多步洗涤并组合而成的在20÷120°C的温度下在空气中干燥,其特征在于,将基于2 M水溶液制备的0.5 M的Bi(NO)硝酸铋溶液3次引入NPS基质的孔中,在(22±2)C HNO的温度下浸渍24小时至最后24小时,将样品在30-65°C干燥40-60分钟,然后将获得的浸渍并干燥的样品在在电炉中将其置于空气中,然后将样品放在高纯度石英玻璃的基板上,并使用从石英基板的侧面进料的氢氧燃烧器加热5分钟。 2.根据权利要求1所述的方法,其特征在于,将所述样品浸渍在基于2M HNO溶液制备的0.01-0.05M Bi(NO)溶液中; 3.根据权利要求1所述的方法,其特征在于,所述热处理在室温至〜900℃的温度下以1-4度/分钟的加热速率进行,然后在≥1500℃的温度下进行; 4.根据权利要求1所述的方法,其特征在于,所述热处理是根据从室温到≥1500℃的多阶段温度-时间方案进行的,而在第一阶段中,所述热处理是从室温进行的。室温(18±2°C)至115±2°C,加热速率为3-4度/分钟,快门速度为30分钟;在第二阶段中,以115±2°C到420±2°C的温度进行热处理,加热速度为1-2 grad / min,快门速度为60 min,在第三阶段中,进行热处理在420±2°C至565±2°C的温度下进行

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