首页> 外国专利> COMPOSITION FOR PASSIVATION LAYER FORMATION, PASSIVATION LAYER-ATTACHED SEMICONDUCTOR SUBSTRATE, METHOD FOR MANUFACTURING PASSIVATION LAYER-ATTACHED SEMICONDUCTOR SUBSTRATE, SOLAR BATTERY ELEMENT, METHOD FOR MANUFACTURING SOLAR BATTERY ELEMENT, AND SOLAR BATTERY

COMPOSITION FOR PASSIVATION LAYER FORMATION, PASSIVATION LAYER-ATTACHED SEMICONDUCTOR SUBSTRATE, METHOD FOR MANUFACTURING PASSIVATION LAYER-ATTACHED SEMICONDUCTOR SUBSTRATE, SOLAR BATTERY ELEMENT, METHOD FOR MANUFACTURING SOLAR BATTERY ELEMENT, AND SOLAR BATTERY

机译:钝化层形成的组成,钝化层附着的半导体基质,钝化层附着的半导体基质的制造方法,太阳能电池元件,制造太阳能电池元件的方法以及太阳能电池

摘要

PROBLEM TO BE SOLVED: To provide a composition for passivation layer formation, which enables the formation of a passivation layer achieving a satisfactory film quality and having an excellent passivation effect by a simple and easy method.SOLUTION: A composition for passivation layer formation comprises a compound represented by the following general formula (I): Bi(OR)(I) [R's independently represent an alkyl group, an aryl group or an acyl group; and m represents 3 or 5]. In the compound represented by the general formula (I), tri-n-butoxy bismuth accounts for 30-100 mass%.SELECTED DRAWING: None
机译:解决的问题:提供一种用于形成钝化层的组合物,其能够通过简单的方法形成具有令人满意的膜质量并且具有优异的钝化效果的钝化层。由以下通式(I)表示的化合物:Bi(OR)(I)[R'独立地表示烷基,芳基或酰基; m表示3或5]。通式(I)表示的化合物中,三正丁氧基铋占30〜100质量%。

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