Functional fine line pattern precursor forming method, functional fine line pattern forming method, transparent conductive film forming method, device manufacturing method and electronic device manufacturing method, functional thin line pattern, substrate with transparent conductive film, Devices and electronic equipment

摘要

The invention provides a functional thin line pattern precursor forming method capable of stably forming a functional thin line with high freedom degree, a functional thin line pattern forming method, a transparent electroconductive film forming method, a component unit manufacturing method, an electronic device manufacturing method, a functional thin line pattern, a transparent electroconductive film, a component unit and an electronic device. A closed geometrical figure is formed on a substrate (1) by line-shaped liquid (2) containing a functional material, and the linear liquid (2) is dried to deposit functional material on the edge portions (21, 22), thereby forming a functional thin line unit (3) composed of an inner thin wire (31) containing a functional material and an outer thin wire (32); and one or a plurality of functional thin wire units (3) are juxtaposed to form a functional thin wire pattern. By the functional thin wire unit (3) is used as a functional thin line pattern precursor, a part of the fine wire consisting of the inner thin wire (31) and the outer fine wire (32) is removed, and the un-removed and remained thin wire is used to form the functional thin line pattern.