首页> 外国专利> Curved grating spectrometer and wavelength multiplexer or demultiplexer with very high wavelength resolution

Curved grating spectrometer and wavelength multiplexer or demultiplexer with very high wavelength resolution

机译:弯曲光栅光谱仪和具有非常高的波长分辨率的波长复用器或解复用器

摘要

The present application discloses a system comprising a compact curved grating (CCG) and its associated compact curved grating spectrometer (COGS) or compact curved grating wavelength multiplexer/demultiplexer (WMDM) module and a method for making the same. The system is capable of achieving a very small (resolution vs. size) RS factor. The location of the entrance slit and detector can be adjusted in order to have the best performance for a particular design goal. The initial groove spacing is calculated using a prescribed formula dependent on operation wavelength. The location of the grooves is calculated based on two conditions. The first one being that the path-difference between adjacent grooves should be an integral multiple of the wavelength in the medium to achieve aberration-free grating focusing at the detector or a first anchor output slit even with large beam diffraction angle from the entrance slit or input slit, the second one being specific for a particular design goal of a curved-grating spectrometer.
机译:本申请公开了一种包括紧凑型弯曲光栅(CCG)及其相关的紧凑型弯曲光栅光谱仪(COGS)或紧凑型弯曲光栅波长复用器/解复用器(WMDM)模块的系统及其制造方法。该系统能够实现非常小的(分辨率与尺寸)RS因子。可以调整入口缝隙和检测器的位置,以针对特定设计目标获得最佳性能。使用取决于工作波长的规定公式来计算初始凹槽间距。凹槽的位置是根据两个条件计算得出的。第一个是相邻凹槽之间的光程差应该是介质中波长的整数倍,以实现无像差光栅聚焦在检测器或第一锚定输出狭缝上,即使入射狭缝或入射狭缝的光束衍射角很大。输入狭缝,第二个狭缝专门针对曲面光栅光谱仪的特定设计目标。

著录项

  • 公开/公告号US9939320B2

    专利类型

  • 公开/公告日2018-04-10

    原文格式PDF

  • 申请/专利权人 ELECTRONIC PHOTONIC IC INC. (EPIC INC.);

    申请/专利号US201615362037

  • 发明设计人 SENG-TIONG HO;YINGYAN HUANG;

    申请日2016-11-28

  • 分类号G01J3/28;G01J3/20;G01J3/04;G01J3/02;G02B6/293;G02B5/18;G01J3/18;

  • 国家 US

  • 入库时间 2022-08-21 12:54:49

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