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PAIR OF ELECTRODES FOR DIELECTRIC BARRIER DISCHARGE (DBD) PLASMA PROCESS
PAIR OF ELECTRODES FOR DIELECTRIC BARRIER DISCHARGE (DBD) PLASMA PROCESS
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机译:对电介质阻挡放电(DBD)等离子体工艺的电极对
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摘要
The present invention concerns a device (10) for the surface treatment of a substrate (1) by dielectric barrier discharge that enables the generation of a cold filamentary plasma at atmospheric pressure, comprising a reaction chamber, in which are positioned means for supporting and/or moving the substrate (2) and at least two electrodes (3, 4) arranged in parallel on either side of the means for supporting and/or moving the substrate (2), of which one electrode (3) is intended to be brought to high voltage and a counter-electrode (4) to be earthed. It is characterised in that the counter-electrode (4) has a width (lce) and a length (Lce) that are respectively smaller than the width (le) and the length (Le) of the electrode (3), and in that the counter-electrode (4) is positioned so that it is enclosed in an orthogonal projection (5) of the electrode (3) on a plane containing the counter-electrode (4). The invention also concerns a surface treatment process, in particular for layer deposition, that calls for such a device.
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机译:本发明涉及一种用于通过介电势垒放电对衬底(1)进行表面处理的设备(10),该设备(10)能够在大气压力下生成冷的丝状等离子体,该设备(10)包括反应室,在该反应室中放置了用于支撑和/或支撑装置。或移动基板(2)和平行布置在支撑和/或移动基板(2)的装置两侧的至少两个电极(3、4),其中一个电极(3)打算被带入接至高压,并将对电极(4)接地。其特征在于,对电极(4)的宽度(l ce Sub>)和长度(L ce Sub>)分别小于宽度(l < Sub> e Sub>)和电极(3)的长度(L e Sub>),并且对电极(4)的位置应使其包围在正交投影中电极(3)的(5)在包含反电极(4)的平面上。本发明还涉及一种表面处理工艺,特别是用于层沉积的表面处理工艺,其需要这种装置。
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