首页> 外国专利> PAIR OF ELECTRODES FOR DIELECTRIC BARRIER DISCHARGE (DBD) PLASMA PROCESS

PAIR OF ELECTRODES FOR DIELECTRIC BARRIER DISCHARGE (DBD) PLASMA PROCESS

机译:对电介质阻挡放电(DBD)等离子体工艺的电极对

摘要

The present invention concerns a device (10) for the surface treatment of a substrate (1) by dielectric barrier discharge that enables the generation of a cold filamentary plasma at atmospheric pressure, comprising a reaction chamber, in which are positioned means for supporting and/or moving the substrate (2) and at least two electrodes (3, 4) arranged in parallel on either side of the means for supporting and/or moving the substrate (2), of which one electrode (3) is intended to be brought to high voltage and a counter-electrode (4) to be earthed. It is characterised in that the counter-electrode (4) has a width (lce) and a length (Lce) that are respectively smaller than the width (le) and the length (Le) of the electrode (3), and in that the counter-electrode (4) is positioned so that it is enclosed in an orthogonal projection (5) of the electrode (3) on a plane containing the counter-electrode (4). The invention also concerns a surface treatment process, in particular for layer deposition, that calls for such a device.
机译:本发明涉及一种用于通过介电势垒放电对衬底(1)进行表面处理的设备(10),该设备(10)能够在大气压力下生成冷的丝状等离子体,该设备(10)包括反应室,在该反应室中放置了用于支撑和/或支撑装置。或移动基板(2)和平行布置在支撑和/或移动基板(2)的装置两侧的至少两个电极(3、4),其中一个电极(3)打算被带入接至高压,并将对电极(4)接地。其特征在于,对电极(4)的宽度(l ce )和长度(L ce )分别小于宽度(l < Sub> e )和电极(3)的长度(L e ),并且对电极(4)的位置应使其包围在正交投影中电极(3)的(5)在包含反电极(4)的平面上。本发明还涉及一种表面处理工艺,特别是用于层沉积的表面处理工艺,其需要这种装置。

著录项

  • 公开/公告号EA028651B1

    专利类型

  • 公开/公告日2017-12-29

    原文格式PDF

  • 申请/专利权人 ASAHI GLASS COMPANY LIMITED;

    申请/专利号EA20150090727

  • 发明设计人 M. ERIC;M. ERIC;M. JOSEPH;

    申请日2013-12-18

  • 分类号C23C16/40;C03C17;C23C16/509;C23C16/54;H01J37/32;

  • 国家 EA

  • 入库时间 2022-08-21 12:52:48

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