首页> 外国专利> MEMS STRUCTURE, ELECTROSTATIC CAPACITANCE TYPE SENSOR HAVING MEMS STRUCTURE, PIEZOELECTRIC SENSOR, AND ACOUSTIC SENSOR

MEMS STRUCTURE, ELECTROSTATIC CAPACITANCE TYPE SENSOR HAVING MEMS STRUCTURE, PIEZOELECTRIC SENSOR, AND ACOUSTIC SENSOR

机译:具有MEMS结构,压电传感器和声学传感器的MEMS结构,静电电容型传感器

摘要

The present invention relates to an electrostatic capacitance type sensor manufactured using MEMS technology, and provides a technique which enables a high SN ratio to be obtained, and which enables an increase in resistance to input pressure. An electrostatic capacitance type sensor which converts a displacement of a diaphragm into a change in an electrostatic capacitance between the diaphragm and a back plate is configured in such a way that part of the external shape of the diaphragm is disposed inward of an opening in a base plate, when seen in a normal line direction, and another part of the external shape of the diaphragm is disposed outward of the opening in the base plate, when seen in the normal line direction.
机译:本发明涉及一种使用MEMS技术制造的静电电容型传感器,并且提供了一种能够获得高SN比并且能够增加对输入压力的抵抗力的技术。静电电容型传感器将隔膜的位移转换成隔膜与背板之间的静电电容的变化,从而将隔膜的外形的一部分设置在基座的开口的内侧。当沿法线方向看时,该隔板的外部形状的另一部分设置在基板中的开口中,当沿法线方向看时,该隔板的外部的另一部分设置在基板的开口的外侧。

著录项

  • 公开/公告号WO2018008181A1

    专利类型

  • 公开/公告日2018-01-11

    原文格式PDF

  • 申请/专利权人 OMRON CORPORATION;

    申请/专利号WO2017JP06396

  • 申请日2017-02-21

  • 分类号H04R7/04;B81B3;H01L29/84;H04R1/02;H04R7/22;H04R17/02;H04R19/04;

  • 国家 WO

  • 入库时间 2022-08-21 12:46:28

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