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GAS BARRIER COATING, GAS BARRIER FILM, METHOD FOR PRODUCING GAS BARRIER COATING, AND METHOD FOR PRODUCING GAS BARRIER FILM

机译:气体阻隔涂层,气体阻隔膜,气体阻隔涂层的制造方法以及气体阻隔膜的制造方法

摘要

A gas barrier coating having excellent gas barrier properties and transparency is prepared, the gas barrier coating having an arithmetic mean roughness (Ra) of 2.0 nm or less and having, in a range of 20 nm to 1,000 nm in a thickness direction, a composition which when expressed by SiOxCy is within an area enclosed by the five points of A (x=0.8, y=0.8), B (x=1.2, y=0.8), C (x=1.9, y=0.1), D (x=1.9, y=0.0), and E (x=0.8, y=0.55) in an orthogonal coordinate system where x is the horizontal axis and y is the vertical axis.
机译:制备具有优异的阻气性和透明性的阻气涂层,该阻气涂层的算术平均粗糙度(Ra)为2.0nm或更小,并且在厚度方向上具有在20nm至1,000nm范围内的组成。当用SiO x Cy表示时,该区域位于A(x = 0.8,y = 0.8),B(x = 1.2,y = 0.8),C(x =在其中x是水平轴且y是垂直轴的正交坐标系中,D分别为1.9,y = 0.1),D(x = 1.9,y = 0.0)和E(x = 0.8,y = 0.55)。

著录项

  • 公开/公告号WO2018168671A1

    专利类型

  • 公开/公告日2018-09-20

    原文格式PDF

  • 申请/专利权人 KONICA MINOLTA INC.;

    申请/专利号WO2018JP09140

  • 发明设计人 MORI TAKAHIRO;

    申请日2018-03-09

  • 分类号C23C16/42;B32B9;C23C16/30;C23C16/50;

  • 国家 WO

  • 入库时间 2022-08-21 12:42:41

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