COMPOUNDS AND METHODS FOR MANUFACTURING THE SAME, COMPOSITIONS, COMPOSITIONS FOR OPTICAL COMPONENTS FOR FORMING, FILM FORMING COMPOSITION FOR LITHOGRAPHY, RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, RADIATELY RADIATING COMPOSITION, AMOLUTION FILM PRODUCTION METHOD, LITHOGRAPHY RUBBER FILM FORMING MATERIAL, A composition for forming a lower layer film, a method for producing a lower layer film for lithography, a resist pattern forming method, a circuit pattern forming method, and a refining method

摘要

A compound represented by the following formula (1), a process for producing the same, a composition for forming an optical component, a film forming composition for lithography, a resist composition, a resist pattern forming method, a radiation sensitive composition, a method for manufacturing an amorphous film, A lower layer film forming material, a composition for forming a lower layer film for lithography, a manufacturing method of a lower layer film for lithography, a resist pattern forming method, a circuit pattern forming method, and a refining method. (One) (Wherein R ¹ is a 2n-valent group or a single bond having 1 to 60 carbon atoms, and R ² to R ⁵ each independently represent a linear, branched or cyclic alkyl group having 1 to 30 carbon atoms, An alkenyl group having 2 to 30 carbon atoms, a group represented by the following formula (A), a group represented by the following formula (B), a thiol group or a hydroxyl group, wherein R ² to R ⁵ At least one group selected from the group consisting of a group represented by the formula (A) and a group represented by the following formula (B), m ² and m ³ each independently represent an integer of 0 to 8 M ⁴ and m ⁵ are each independently an integer of 0 to 9, provided that m ² , m ³ , m ⁴ and m ⁵ do not become 0 at the same time, n is an integer of 1 to 4, and p ² ~ p ⁵ each independently is an integer from 0-2. (A) (In the formula (A), R ⁶ is each independently an alkylene group having 1 to 4 carbon atoms, and m 'is an integer of 1 or more.) (B) (In the formula (B), R ⁶ is the same as the above, R ⁷ is a hydrogen atom or a methyl group, and m "is an integer of 0 or 1)