ORGANIC DEVELOPMENT PROCESSING APPARATUS AND ORGANIC DEVELOPMENT PROCESSING METHOD

摘要

The present invention provides an organic development processing method and an organic development processing apparatus capable of stabilizing a fine line width of a circuit pattern and improving a throughput without being influenced by a time difference of an organic development process without using a rinsing liquid . A development nozzle 30 for discharging a developer containing an organic solvent all over the surface of the wafer W in a developing process in which a resist is applied to the surface of the wafer W and a developing solution is supplied to the surface of the wafer W after exposure, And a gas nozzle 40 for discharging the N ₂ gas for stopping and drying the development over the entire surface of the wafer W. The developer is discharged from the developing nozzle 30 over the entire surface of the wafer W to simultaneously form a liquid film of the developer containing the organic solvent over the entire surface of the wafer W. Then, The N ₂ gas is discharged to the entire surface of the wafer W, the development is stopped, the developer is removed, and the wafer W is dried.