PHOTO-CURABLE RESIN COMPOSITION PHOTO-CURABLE DRY FILM PATTERNING PROCESS PROTECTIVE FILM FOR ELECTIC/ELECTRONIC PART AND ELECTIC/ELECTRONIC PART

摘要

Disclosure of the Invention The present invention is to provide a film which can easily form a pattern and which is excellent in various film properties, in particular, adhesion to a base material used for a circuit board, A photopolymerizable resin composition containing a silicon-containing polymeric compound and a specific photoacid generator, which is excellent in migration resistance of copper (copper) and which imparts a highly reliable film, and also provides a pattern forming method and a coating for protecting electric / electronic parts . In order to solve the above problems, the present invention provides a process for producing a silicon-containing polymer having a repeating unit represented by the formula (1), a silicon-containing polymer compound having a weight average molecular weight of 3,000 to 500,000, a photobase generator represented by the formula (4) And a cross-linking agent comprising an epoxy resin according to the following formula.