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FITTING OF OPTICAL MODEL WITH DIFFRACTION EFFECTS TO MEASURED SPECTRUM
FITTING OF OPTICAL MODEL WITH DIFFRACTION EFFECTS TO MEASURED SPECTRUM
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机译:具有衍射效应的光学模型对所测光谱的拟合
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摘要
A polishing operation control method includes obtaining a sequence over time of spectra measured with an in-situ optical monitoring system during polishing. An optical model is fitted for each measured spectrum from the sequence. Wherein the optical model includes dimensions of an iterative structure, the fitting comprises calculating an output spectrum using diffraction effects of the iterative structure, the parameters of the optical model including an endpoint parameter and a parameter of the iterative structure do. The fitting step produces a sequence of fitted end point parameter values and is determined from a sequence of endpoint parameter values to which at least one of the adjustment of the pressure or the polishing end point to the substrate has been fitted.
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