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FITTING OF OPTICAL MODEL WITH DIFFRACTION EFFECTS TO MEASURED SPECTRUM

机译:具有衍射效应的光学模型对所测光谱的拟合

摘要

A polishing operation control method includes obtaining a sequence over time of spectra measured with an in-situ optical monitoring system during polishing. An optical model is fitted for each measured spectrum from the sequence. Wherein the optical model includes dimensions of an iterative structure, the fitting comprises calculating an output spectrum using diffraction effects of the iterative structure, the parameters of the optical model including an endpoint parameter and a parameter of the iterative structure do. The fitting step produces a sequence of fitted end point parameter values and is determined from a sequence of endpoint parameter values to which at least one of the adjustment of the pressure or the polishing end point to the substrate has been fitted.
机译:抛光操作控制方法包括获得在抛光期间利用原位光学监视系统测量的光谱随时间的序列。光学模型适合该序列中的每个测得光谱。其中光学模型包括迭代结构的尺寸,拟合包括使用迭代结构的衍射效应计算输出光谱,光学模型的参数包括终点参数和迭代结构的参数。拟合步骤产生一系列拟合的终点参数值,并由一系列的终点参数值确定,其中,对基板的压力或抛光终点的调节中的至少一个已经拟合到该终点参数值。

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