首页> 外国专利> COALESCED NANOWIRE STRUCTURES WITH INTERSTITIAL VOIDS

COALESCED NANOWIRE STRUCTURES WITH INTERSTITIAL VOIDS

机译:具有空隙空隙的成束纳米结构

摘要

A semiconductor device, such as an LED, includes a plurality of first conductivity type semiconductor nanowire cores located over a support, a continuous second conductivity type semiconductor layer extending over and around the cores, a plurality of interstitial voids located in the second conductivity type semiconductor layer and extending between the cores, and first electrode layer that contacts the second conductivity type semiconductor layer and extends into the interstitial voids.
机译:半导体器件,例如LED,包括:多个第一导电类型的半导体纳米线芯,其位于支撑体上;连续的第二导电类型的半导体层,其在芯上和周围延伸;多个间隙空隙,其位于第二导电类型的半导体中第一电极层和第一电极层与第二导电型半导体层接触并延伸到间隙空隙中,并且在芯之间延伸。

著录项

  • 公开/公告号EP2761679B1

    专利类型

  • 公开/公告日2019-06-26

    原文格式PDF

  • 申请/专利权人 GLO AB;

    申请/专利号EP20120836269

  • 申请日2012-09-25

  • 分类号H01L33/02;H01L33/04;H01L33/22;H01L33/18;H01L33/24;H01L33/08;

  • 国家 EP

  • 入库时间 2022-08-21 12:31:47

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