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TECHNIQUE FOR MEASURING A MATRIX POTENTIAL AND/OR A VAPOUR PRESSURE IN A MEDIUM TO BE INVESTIGATED
TECHNIQUE FOR MEASURING A MATRIX POTENTIAL AND/OR A VAPOUR PRESSURE IN A MEDIUM TO BE INVESTIGATED
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机译:用于测量待研究介质中基质势和/或蒸气压的技术
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摘要
Apparatus (100) for measuring a matrix potential and / or a vapor pressure in a medium to be examined (190) is provided. The device (100) comprises an optical waveguide device (120), in which a capillary (126) is formed, which can be brought into contact with the medium to be examined (190), wherein the capillary (126) one of the matrix potential and / or vapor pressure in the medium to be examined (190) dependent water level (128); a light source (140) for introducing light at an input intensity into the optical waveguide (120) so that the light transmits through the capillary (126); a measuring device (160) for measuring an output intensity of the light at a position of the optical waveguide (120) at which the light has transmitted the capillary (126) at least once; and computing means for determining the matrix potential and / or the vapor pressure in the medium (190) to be examined. Furthermore, a chip laboratory (700) and a method (800) are provided in which the device (100) is used.
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