首页> 外国专利> TECHNIQUE FOR MEASURING A MATRIX POTENTIAL AND/OR A VAPOUR PRESSURE IN A MEDIUM TO BE INVESTIGATED

TECHNIQUE FOR MEASURING A MATRIX POTENTIAL AND/OR A VAPOUR PRESSURE IN A MEDIUM TO BE INVESTIGATED

机译:用于测量待研究介质中基质势和/或蒸气压的技术

摘要

Apparatus (100) for measuring a matrix potential and / or a vapor pressure in a medium to be examined (190) is provided. The device (100) comprises an optical waveguide device (120), in which a capillary (126) is formed, which can be brought into contact with the medium to be examined (190), wherein the capillary (126) one of the matrix potential and / or vapor pressure in the medium to be examined (190) dependent water level (128); a light source (140) for introducing light at an input intensity into the optical waveguide (120) so that the light transmits through the capillary (126); a measuring device (160) for measuring an output intensity of the light at a position of the optical waveguide (120) at which the light has transmitted the capillary (126) at least once; and computing means for determining the matrix potential and / or the vapor pressure in the medium (190) to be examined. Furthermore, a chip laboratory (700) and a method (800) are provided in which the device (100) is used.
机译:提供了一种用于测量待检查介质(190)中的基质电势和/或蒸气压的设备(100)。装置(100)包括光波导装置(120),在其中形成毛细管(126),该毛细管可以与待检查的介质(190)接触,其中毛细管(126)是基质之一取决于水位(128)的待检查介质(190)中的电势和/或蒸气压;光源(140),用于将输入强度的光引入光波导(120),使光透过毛细管(126)。测量装置(160),用于在光已经透射过毛细管(126)至少一次的光波导(120)的位置处测量光的输出强度;用于确定待检查的介质(190)中的基质电势和/或蒸气压的计算装置。此外,提供了使用设备(100)的芯片实验室(700)和方法(800)。

著录项

  • 公开/公告号EP3540434A1

    专利类型

  • 公开/公告日2019-09-18

    原文格式PDF

  • 申请/专利权人 METER GROUP AG;

    申请/专利号EP20180161732

  • 发明设计人 HIRTE JOSEF;VON UNOLD GEORG;

    申请日2018-03-14

  • 分类号G01N33/24;G01N21/85;

  • 国家 EP

  • 入库时间 2022-08-21 12:28:59

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