IMPRINT DEVICE, IMPRINT METHOD, DETERMINATION METHOD OF ARRANGEMENT PATTERN OF IMPRINT MATERIAL, AND MANUFACTURING METHOD OF ARTICLE

摘要

PROBLEM TO BE SOLVED: To provide an imprint method advantageous for pattern defect suppression.;SOLUTION: An imprint device 100 for forming a pattern of an imprint material R on a first layer by molding and hardening an imprint material R type M supplied onto the first layer provided on a board W, has an observation part 150 for observing the borderline of a region provided with the first layer and a region not provided with the first layer, and the outer periphery 201 of the board W, on one side of the board W, and a control section 160 for controlling the arrangement pattern of the imprint material R on the first layer, on the basis of the observation results of the borderline and the outer periphery 201 by the observation part 150.;SELECTED DRAWING: Figure 1;COPYRIGHT: (C)2019,JPO&INPIT