首页> 外国专利> Alloy for seed layer of Ni-Cu based magnetic recording medium, sputtering target material and magnetic recording medium

Alloy for seed layer of Ni-Cu based magnetic recording medium, sputtering target material and magnetic recording medium

机译:Ni-Cu基磁记录介质的种子层用合金,溅射靶材和磁记录介质

摘要

The objective of the present invention is to provide: an alloy for a seed layer of a Ni-Cu-based magnetic recording medium, the alloy being used for a seed layer in a perpendicular magnetic recording medium; and a sputtering target material. To achieve this objective, the present invention provides a Ni-Cu-M alloy for a seed layer of a magnetic recording medium, the Ni-Cu-M alloy comprising: 1-50 at% Cu; as the M element(s), 2-20 at% of at least one type of M1 element selected from W, Mo, Ta, Cr, V, and Nb, and 0-10 at% of at least one type of M3 element selected from Al, Ga, In, Si, Ge, Sn, Zr, Ti, Hf, B, P, C, and Ru; and Ni and inevitable impurities as the remainder. The present invention also provides a sputtering target material using said alloy, and a magnetic recording medium.
机译:本发明的目的是提供:用于Ni-Cu基磁记录介质的种子层的合金,该合金用于垂直磁记录介质中的种子层;溅射靶材。为了实现该目的,本发明提供了一种用于磁记录介质的种子层的Ni-Cu-M合金,该Ni-Cu-M合金包含:1-50at%的Cu;和作为M元素,选自W,Mo,Ta,Cr,V和Nb的至少一种M1元素的2-20at%,以及至少一种M3元素的0-10at%。选自Al,Ga,In,Si,Ge,Sn,Zr,Ti,Hf,B,P,C和Ru; Ni和不可避免的杂质作为剩余物。本发明还提供使用所述合金的溅射靶材和磁记录介质。

著录项

  • 公开/公告号JP6502672B2

    专利类型

  • 公开/公告日2019-04-17

    原文格式PDF

  • 申请/专利权人 山陽特殊製鋼株式会社;

    申请/专利号JP20150002755

  • 发明设计人 長谷川 浩之;新村 夢樹;

    申请日2015-01-09

  • 分类号G11B5/73;G11B5/851;G11B5/84;

  • 国家 JP

  • 入库时间 2022-08-21 12:20:02

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