処理液供給装置、塗布処理装置及び処理液供給装置の供給管の洗浄方法

摘要

PROBLEM TO BE SOLVED: To reduce liquid or time required for cleaning a supply pipe of a process liquid supply device.;SOLUTION: A resist liquid supply device 32 is configured to supply a resist liquid to a resist application nozzle 142 which discharges the resist liquid to a wafer, via a supply pipe 207 of which the liquid contact surface is formed of an insulative resin. The resist liquid supply device comprises: a stirring mechanism 210 which performs predetermined processing for releasing a foreign substance from the liquid contact surface with an electrostatic repulsive force when passing a predetermined liquid through the supply pipe 207, on the predetermined liquid; and a first filter 205 having a potential of positive polarity and a second filter 206 having a potential of negative polarity which are provided on a downstream side of a buffer tank 203 including the stirring mechanism 210.;SELECTED DRAWING: Figure 6;COPYRIGHT: (C)2019,JPO&INPIT