首页>
外国专利>
Bright And Clean X-Ray Source For X-Ray Based Metrology
Bright And Clean X-Ray Source For X-Ray Based Metrology
展开▼
机译:适用于基于X射线的度量衡的明亮,干净的X射线源
展开▼
页面导航
摘要
著录项
相似文献
摘要
Methods and systems for x-ray based semiconductor metrology utilizing a clean, hard X-ray illumination source are described herein. More specifically, a laser produced plasma light source generates high brightness, hard x-ray illumination having energy in a range of 25,000 to 30,000 electron volts. To achieve high brightness, a highly focused, very short duration laser beam is focused onto a dense Xenon target in a liquid or solid state. The interaction of the focused laser pulse with the high density Xenon target ignites a plasma. Radiation from the plasma is collected by collection optics and is directed to a specimen under measurement. The resulting plasma emission is relatively clean because of the use of a non-metallic target material. The plasma chamber is filled with Xenon gas to further protect optical elements from contamination. In some embodiments, evaporated Xenon from the plasma chamber is recycled back to the Xenon target generator.
展开▼