首页> 外国专利> ORGANIC SILICA THIN FILM, METHOD FOR PRODUCING THE SAME, LASER DESORPTION/IONIZATION MASS SPECTROMETRIC SUBSTRATE USING THE SAME, AND LASER DESORPTION/IONIZATION MASS SPECTROMETRIC METHOD

ORGANIC SILICA THIN FILM, METHOD FOR PRODUCING THE SAME, LASER DESORPTION/IONIZATION MASS SPECTROMETRIC SUBSTRATE USING THE SAME, AND LASER DESORPTION/IONIZATION MASS SPECTROMETRIC METHOD

机译:有机硅薄膜,其制备方法,使用该方法的激光解吸/电离质谱光谱和激光解吸/电离质谱法

摘要

An organic silica thin film comprising: organic silica having a light absorbable organic group in a skeleton, wherein the organic group has a local maximum absorption wavelength in a wavelength range of 200 to 1200 nm, a content ratio of silicon and the organic group which constitute the organic silica is in a range of 0.05 to 0.50 based on a ratio of a mass of the silicon to a mass of the organic group ([mass of the silicon]/[mass of the organic group]), the thin film has a textured structure, and an axis direction of the textured structure is a direction substantially perpendicular to a surface opposite to a surface of the organic silica thin film having the textured structure formed therein.
机译:1。一种有机二氧化硅薄膜,其特征在于,具有:在骨架上具有光吸收性有机基团的有机二氧化硅,其中,所述有机基团具有在200〜1200nm的波长范围内的局部最大吸收波长,以及构成该有机基团的硅与有机基团的含有比例。基于硅的质量与有机基团的质量之比([硅的质量] / [有机基的质量]),有机二氧化硅在0.05至0.50的范围内,薄膜具有纹理结构,并且该纹理结构的轴方向是基本垂直于与其中形成有纹理结构的有机二氧化硅薄膜的表面相对的表面的方向。

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