ELECTRON MICROSCOPE DEVICE, INSPECTION SYSTEM USING ELECTRON MICROSCOPE DEVICE, AND INSPECTION METHOD USING ELECTRON MICROSCOPE DEVICE

摘要

An electron microscope device having: a detection part that detects reflected electrons which have reflected from a sample that has been irradiated with primary electrons emitted from a primary electron generation part (an electron gun); an image generation part that, on the basis of output from the detection part, generates an image of the surface of the sample that is based on the reflected electrons; and a processing part that generates a differential waveform signal for the image generated by the image generation part and uses information about the differential waveform signal to process the image and measure the dimensions of a pattern that is formed on the sample.