METHOD FOR MANUFACTURING BPS-TYPE ARRAY SUBSTRATE AND BPS-TYPE ARRAY SUBSTRATE

摘要

The present invention provides a method for manufacturing a BPS-type array substrate and a BPS-type array substrate. The method for manufacturing the BPS-type array substrate of the present invention comprises, using a double-layer photoresist structure formed by a first photoresist layer and a second photoresist layer to jack up a main liner portion and an auxiliary liner portion of a main spacer and an auxiliary spacer, respectively, such that the main liner portion and the auxiliary liner portion protrude obviously, such that the thickness of the main spacer and the auxiliary spacer itself is therefore reduced, thereby reducing the amount of BPS material used for forming the main spacer and the auxiliary spacer, reducing the production cost; the height difference between the main spacer and the auxiliary spacer can be realized by thinning the thickness of the first color resist layer under the auxiliary liner portion by means of a half-exposure process, and the manufacturing method is simple.