PLASMA PROCESSING APPARATUS ELECTROSTATIC ATTRACTION METHOD AND ELECTROSTATIC ATTRACTION PROGRAM

摘要

The present invention can suppress the degradation of the attraction force of a focus ring. The focus ring (30) is arranged on the outer peripheral part (25b) of an electrostatic chuck (25) and an electrode plate (29) is installed to face the focus ring (30) inside. A DC power source (28) periodically applies a voltage of a different polarity or a voltage with a large absolute value stepwise to the electrode plate (29) during a plasma processing period.