Apparatus for material deposition on a substrate in a vacuum deposition process, system for sputter deposition on a substrate, and method for manufacturing an apparatus for material deposition on a substrate

摘要

The present disclosure provides apparatus for material deposition on a substrate in a vacuum deposition process. The apparatus includes a target support, two or more target segments supported by the target support, a first gap being provided between adjacent target segments of two or more target segments, and two or more bonding layer portions, Each bonding layer portion of the at least two bonding layer portions bonds the respective target segment of the at least two target segments to the target support portion and the bonding layer portions of adjacent target segments are separated from each other by a second gap greater than the first gap .