首页> 外国专利> VAPORIZER FOR PARYLENE DEPOSITION EQUIPMENT CAPABLE OF CONTROLLING DISCHARGE OF GAS PHASE PARYLENE DIMER, OPERATION METHOD THEREOF, AND PARYLENE DEPOSITION EQUIPMENT HAVING SAME

VAPORIZER FOR PARYLENE DEPOSITION EQUIPMENT CAPABLE OF CONTROLLING DISCHARGE OF GAS PHASE PARYLENE DIMER, OPERATION METHOD THEREOF, AND PARYLENE DEPOSITION EQUIPMENT HAVING SAME

机译:能够控制气相聚对二甲苯二聚体排放的聚对二甲苯沉积设备的蒸发器,其操作方法以及具有相同特性的聚对二甲苯沉积设备

摘要

The present invention relates to a vaporizer for parylene deposition equipment capable of controlling discharge of gas phase parylene dimer, an operation method thereof, and parylene deposition equipment having the same. The vaporizer for parylene deposition equipment capable of controlling discharge of gas phase parylene dimer comprises: a container in which parylene dimer powder is stored; a discharge pipe connected to the container; a discharge control unit installed in the discharge pipe and controlling discharge of the gas phase parylene dimer generated from the parylene dimer powder in the container; and a heat insulation unit covering the discharge pipe and the discharge control unit and keeping temperature of the discharge pipe and the discharge control unit higher than vaporization temperature of the parylene dimer powder.;COPYRIGHT KIPO 2019
机译:本发明涉及一种能够控制气相聚对二甲苯二聚体的排出的聚对二甲苯沉积设备的蒸发器,其操作方法以及具有该蒸发器的聚对二甲苯沉积设备。能够控制气相聚对二甲苯二聚体的排出的聚对二甲苯沉积设备的汽化器包括:容纳聚对二甲苯二聚体粉末的容器;以及用于容纳聚对二甲苯二聚体粉末的容器。连接到容器的排放管;排放控制单元,其安装在排放管中,并控制由容器中的聚对二甲苯二聚体粉末产生的气相聚对二甲苯二聚体的排放;隔热单元覆盖排放管和排放控制单元,并使排放管和排放控制单元的温度高于聚对二甲苯二聚体粉末的汽化温度.COPYRIGHT KIPO 2019

著录项

  • 公开/公告号KR20190060272A

    专利类型

  • 公开/公告日2019-06-03

    原文格式PDF

  • 申请/专利权人 IOF;

    申请/专利号KR20170158317

  • 申请日2017-11-24

  • 分类号C23C16/448;C23C16/52;

  • 国家 KR

  • 入库时间 2022-08-21 11:50:46

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