首页> 外国专利> Ti3AlC2 Ti3AlC2 Preparation method of Ti3AlC2 tape and the joining method of silicon carbide using the same

Ti3AlC2 Ti3AlC2 Preparation method of Ti3AlC2 tape and the joining method of silicon carbide using the same

机译:Ti3AlC2 Ti3AlC2 Ti3AlC2带的制备方法以及使用该带的碳化硅接合方法

摘要

The present invention relates to a method of producing a Ti_3AlC_2 tape for a bonding material and a method of bonding silicon carbide using the Ti_3AlC_2 tape for the bonding material. When the Ti_3AlC_2 tape for a bonding material produced by the method according to the present invention is used, the method can realize bonding enabling the Ti_3AlC_2 tape for a bonding material to be used as a high temperature structural material or a nuclear reactor structural material by realizing bonding of silicon carbide monolith or silicon carbide fiber-reinforced silicon carbide composite (SiC_f/SiC) which can be used from room temperature to a high temperature of 1,500°C in an atmosphere where oxygen does not exist. Further, bonding uniformity can be improved by using the Ti_3AlC_2 tape for a bonding material produced by the method according to the present invention in bonding of a complicated shape. Further, characteristics′ deterioration due to the presence of a bonding material, an alien substance, is prevented and characteristics of a silicon carbide (SiC) base material can be obtained by providing a bonding method for maintaining the Ti_3AlC_2 tape for a bonding material at high temperatures for a long time, thereby diffusing the Ti_3AlC_2 tape for a bonding material into a bonding base material of silicon carbide (SiC) such that the bonding material is not present.
机译:本发明涉及一种用于粘结材料的Ti_3AlC_2带的制造方法和一种使用用于粘结材料的Ti_3AlC_2带粘结碳化硅的方法。当使用通过根据本发明的方法生产的用于粘合材料的Ti_3AlC_2带时,该方法可以实现粘合,从而能够实现用于粘合材料的Ti_3AlC_2带用作高温结构材料或核反应堆结构材料。碳化硅整料或碳化硅纤维增强的碳化硅复合材料(SiC_f / SiC)的键合,可以在不存在氧气的气氛中从室温到1,500°C的高温使用。此外,通过将Ti_3AlC_2带材用于通过复杂形状的粘合中的根据本发明的方法生产的粘合材料,可以提高粘合均匀性。此外,通过提供用于将用于接合材料的Ti_3AlC_2带保持在高水平的接合方法,可以防止由于接合材料,异物的存在而导致的特性劣化,并且可以得到碳化硅(SiC)基材的特性。长时间保持高温,从而将用于接合材料的Ti_3AlC_2带扩散到碳化硅(SiC)的接合基材中,使得不存在该接合材料。

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