A method for inspecting a sample using an array of primary charged particle beamlets, a charged particle beam device for inspection of a sample using an array of primary charged particle beamlets, and a multi-column microscope for inspection of the sample

摘要

A method for inspecting a sample using an array of primary charged particle beamlets in a charged particle beam device having an optical axis is disclosed. The method includes generating a primary charged particle beam; Illuminating the multi-aperture lens plate with the primary charged particle beam to produce an array of primary charged particle beamlets; And correcting the field curvature of the charged particle beam device using the first and second field curvature correction electrodes. The method further includes applying a voltage to the first and second field curvature correction electrodes. At least one of the field intensities provided by the first and second field curvature correcting electrodes varies in a plane perpendicular to the optical axis of the charged particle beam device. The method further includes focusing the primary charged particle beamlets on individual locations on the sample using an objective lens.