首页> 外国专利> GOLD-STRIKE PLATING METHOD CORRESPONDING TO PRETREATMENT PROCESS FOR ELECTROLESS PALLADIUM PLATING ON COPPER SURFACE OF PRINTED CIRCUIT BOARD COMPOSITION OF GOLD-STRIKE PLATING SOLUTION AND ELECTROLESS PLATING METHOD OF PALLADIUM AND GOLD

GOLD-STRIKE PLATING METHOD CORRESPONDING TO PRETREATMENT PROCESS FOR ELECTROLESS PALLADIUM PLATING ON COPPER SURFACE OF PRINTED CIRCUIT BOARD COMPOSITION OF GOLD-STRIKE PLATING SOLUTION AND ELECTROLESS PLATING METHOD OF PALLADIUM AND GOLD

机译:对应于在无铅电镀溶液组成的印刷电路板的铜表面上的无电镀钯的预处理工艺的镀金方法和钯金的化学镀方法

摘要

The present invention provides a gold-strike plating solution used to form a gold-strike / palladium / gold plating layer on copper or a copper alloy surface, which comprises: (A) a water-soluble gold compound; (B) a purine compound or a pyrimidine compound having carbonyl oxygen as a local erosion blocker; (C) a complexing agent; (D) a dicarboxylic acid as a conductivity enhancer; (E) (E-1) nitrogen-containing heteroarylcarboxylic acid as a base metal elution inhibition and reprecipitation inhibitor, wherein nitrogen in the component (E-1) is located in a heteroaryl ring and all represents aromatic nitrogen and (E-2) alpha-hydroxycarboxylic acid; (F) a cyanide compound or a sulfite compound as a gold ion stabilizer; and (G) a surface corrosion inhibitor.
机译:本发明提供了用于在铜或铜合金表面上形成金触击/钯/金镀层的触金镀液,其包括:(A)水溶性金化合物; (B)具有羰基氧作为局部腐蚀阻断剂的嘌呤化合物或嘧啶化合物; (C)络合剂; (D)二羧酸作为电导率增强剂; (E)(E-1)含氮杂芳基羧酸作为贱金属洗脱抑制和再沉淀抑制剂,其中组分(E-1)中的氮位于杂芳基环上,并且全部表示芳族氮,并且(E-2) α-羟基羧酸; (F)作为金离子稳定剂的氰化物或亚硫酸盐化合物。 (G)表面腐蚀抑制剂。

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