首页>
外国专利>
Procedure for closing an access opening to a cavity and MEMS component with a closure element
Procedure for closing an access opening to a cavity and MEMS component with a closure element
展开▼
机译:用封闭元件封闭通向空腔和MEMS组件的通道的步骤
展开▼
页面导航
摘要
著录项
相似文献
摘要
A method (100) for closing an access opening (230) to a cavity (220) comprises the following steps: providing (120) a layer arrangement (221) with a first layer structure (210) and one disposed adjacent to the first layer structure (210) Cavity (220), the first layer structure (210) having an access opening (230) to the cavity (220); Performing (140) a CVD layer deposition to form a first cap layer (240) having a layer thickness (D) on the first layer structure (210) with the access opening (230); and performing (160) an HDP film deposition comprising first and second substeps of forming a second cap layer (250) on the first cap layer (240), wherein in the first substep depositing a liner material layer (250) on the first cap layer (12). 240), wherein in the second substep, a partial re-sputtering of the liner material layer (250) and further the first cover layer (240) in the region (230-A) of the access opening (230) takes place, and wherein the first and second substeps alternately and be repeated several times.
展开▼