Imaging optics for the representation of an object field in an image field as well as projection lighting system with such imaging optics

摘要

An imaging optical system (7) for projection lithography has a plurality of mirrors (M1 to M10) for guiding imaging light from an object field (4) in an object plane (5) into an image field (8) in an image plane (9) along an imaging light -Strahlengangs. The imaging optics has a combination of the optical parameters image-side numerical aperture, anamorphic imaging, main beam angle at the object field designed for reflection mask, obscuration, optimized space cuboid and object-image offset, resulting in an optimized combination of good imaging properties and practical usability within a projection exposure system leads.