首页> 外国专利> QUANTUM DOT HAVING POLYMERIC OUTER LAYER, PHOTOSENSITIVE COMPOSITIONS INCLUDING THE SAME, AND QUANTUM DOT POLYMER COMPOSITE PATTERN PRODUCED THEREFROM

QUANTUM DOT HAVING POLYMERIC OUTER LAYER, PHOTOSENSITIVE COMPOSITIONS INCLUDING THE SAME, AND QUANTUM DOT POLYMER COMPOSITE PATTERN PRODUCED THEREFROM

机译:具有聚合物外层的QUANTUM DOT,包括相同的光敏性成分,并由此制得QUANTUM DOT聚合物复合材料

摘要

A photosensitive composition including a quantum dot complex having a polymeric outer layer, a carboxylic acid group-containing binder, a photopolymerizable monomer having a carbon-carbon double bond, a photoinitiator, and a solvent, wherein the polymeric outer layer includes a copolymer including a first repeating unit having a moiety capable of interacting with a surface of the quantum dot, an organic ligand compound bonded to the surface of the quantum dot, or a combination thereof, and a second repeating unit having a reactive moiety.
机译:一种光敏组合物,其包括具有聚合物外层的量子点配合物,含羧酸基的粘合剂,具有碳-碳双键的可光聚合单体,光引发剂和溶剂,其中所述聚合物外层包括包含以下物质的共聚物:第一重复单元,其具有能够与量子点的表面相互作用的部分,键合至量子点的表面的有机配体化合物,或其组合,以及第二重复单元,其具有反应性部分。

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