Film thickness distribution measuring method, film thickness distribution measuring device and film thickness distribution measuring program

摘要

PROBLEM TO BE SOLVED: To provide a film thickness distribution measurement method capable of efficiently measuring film thickness distribution in a wide range.SOLUTION: A film thickness distribution measurement method according to an embodiment of the present invention includes: a spectral reflectance calculating step S5 of calculating the weighted average spectral reflectance R(λ,P) by performing a weighted average for a theoretical value RT(λ,t) of the spectral reflectance for each thickness t of thin films by a distribution function f(t,P) including a distribution parameter P; and an analysis step S6 of calculating the distribution parameter P by applying the weighted average spectral reflectance R(λ,P) to an actual value RM(λ) of the spectral reflectance of the thin film.SELECTED DRAWING: Figure 11