Photomask substrate, photomask blank, photomask, method for manufacturing photomask substrate, method for manufacturing photomask, and method for manufacturing display device

摘要

The invention provides a photomask, photomask substrate, a method for manufacturing a photomask, a method for manufacturing a photomask substrate, a photomask blank, and a method for manufacturing a display device. To provide a photomask substrate capable of minimizing the possibility of generating foreign matters in a cleaning process and suppressing the risk of occurrence of defects in a photomask blank or photomask manufacturing process. A photomask substrate made of a transparent material for forming a transfer pattern to form a photomask, the photomask substrate comprising: a first main surface for forming a transfer pattern; a second main surface , And has an end face perpendicular to these main surfaces. An inclined region is provided in the vicinity of an end of the first main surface, and the inclined region has a first chamfered surface and a first curved surface provided between the first main surface and the first chamfered surface. The first chamfered surface has an inclination angle with respect to the first main surface of 50 degrees or less and has a flat surface. The curvature radius r 1 (mm) of the first curved surface satisfies 0.3 r 1, and the surface roughness Ra of the first curved surface and the first chamfered surface is less than 0.05 mu m.