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Gas-controlled bonding platform for edge defect reduction during wafer bonding

机译:气控键合平台,可减少晶圆键合过程中的边缘缺陷

摘要

A wafer bonding method includes placing a first wafer on a first bonding framework including a plurality of outlet holes around a periphery of the first bonding framework. A second wafer is placed on a second bonding framework that includes a plurality of inlet holes around a periphery of the second bonding framework. The first bonding framework is in overlapping relation to the second bonding framework such that a gap exist between the first wafer and the second wafer. A gas stream is circulated through the gap between the first wafer and the second wafer entering the gap through one or more of the plurality of inlet holes and exiting the gap through one or more of the plurality of outlet holes. The gas stream replaces any existing ambient moisture from the gap between the first wafer and the second wafer.
机译:晶片键合方法包括将第一晶片放置在第一键合框架上,该第一键合框架包括围绕第一键合框架的外围的多个出口孔。将第二晶片放置在第二键合框架上,该第二键合框架包括围绕第二键合框架的外围的多个入口孔。第一键合框架与第二键合框架处于重叠关系,使得在第一晶片和第二晶片之间存在间隙。气流循环通过第一晶片和第二晶片之间的间隙,该间隙通过多个入口孔中的一个或多个进入间隙,并通过多个出口孔中的一个或多个离开间隙。气流替代了第一晶片和第二晶片之间的间隙中任何现有的环境湿气。

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