首页>
外国专利>
PROCESS AND METROLOGY CONTROL, PROCESS INDICATORS AND ROOT CAUSE ANALYSIS TOOLS BASED ON LANDSCAPE INFORMATION
PROCESS AND METROLOGY CONTROL, PROCESS INDICATORS AND ROOT CAUSE ANALYSIS TOOLS BASED ON LANDSCAPE INFORMATION
展开▼
机译:基于景观信息的过程和计量控制,过程指标和根本原因分析工具
展开▼
页面导航
摘要
著录项
相似文献
摘要
Methods and metrology modules are provided, which derive landscape information (expressing relation(s) between metrology metric(s) and measurement parameters) from produced wafers, identifying therein indications for production process changes, and modify production process parameters with respect to the identified indications, to maintain the production process within specified requirements. Process changes may be detected in wafer(s), wafer lot(s) and batches, and the information may be used to detect root causes for the changes with respect to production tools and steps and to indicate tool aging and required maintenance. The information and its analysis may further be used to optimize the working point parameters, to optimizing designs of devices and/or targets and/or to train corresponding algorithms to perform the identifying, e.g., using training wafers.
展开▼