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PROTECTIVE FILM FORMING COMPOSITION HAVING A DIOL STRUCTURE
PROTECTIVE FILM FORMING COMPOSITION HAVING A DIOL STRUCTURE
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机译:具有二元结构的保护膜形成组合物
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摘要
A protective film-forming composition which protects against a semiconductor wet etching solution, contains a solvent and a compound or polymer thereof containing at least one pair including two adjacent hydroxyl groups in a molecule thereof, and forms a protective film which can quickly be removed by dry etching and exhibits excellent resistance against a semiconductor wet etching solution during the lithographic process when producing semiconductors; a method for producing a resist pattern-equipped substrate which uses the protective film; and a method for producing a semiconductor device.
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