Method of producing planar two- and three-dimensional photonic structures

摘要

The object of the invention is the production of two- and three-dimensional photonic planar structures of optical components for applications in integrated optical, photonic, electronic and optoelectronic systems, where components are produced by heating and selective polymerisation of organic salt by electron beam or ion beam. The invention shall apply, inter alia. in integrated systems, also flexible. The way in which two- and three-dimensional planar structures are produced is that the substrate is purified with oxygen plasma,further heated under cover in the 50-150-C temperature, preferably 105-C under the continuous flow of nitrogen N2 or argon Ar, and then an ion liquid of general formula 1 is applied to the cleaned surface. Then, the substrate with the liquid coated is heated at the temperature 30-180-oC, under cover and with the continuous flow of nitrogen N2 or argon Ar, and then developed at the speed 30-200 cube, advantageously 120 cube, to obtain the uniform thickness of the coated layer in the range of 0,1-10 m m, favourable 3-m m,selective electron beam or ion beam with 5-200 keV energy, preferably 30-keV and 0,1-200 mC/cm2 dose under reduced pressure, then the whole is produced in water, or alcohol, or a mixture of alcohol and water or a mixture of different alcohols, in the presence or absence of ultrasound with power 200 -250 W, the whole is then dried at ambient temperature.