PHOTOCHEMICALLY STABLE ANTIFUNGAL WEAR-PROOF SKID-PROOF COMPOSITE TO BE USED IN MUSEUMS AND SPACES FOR STORAGE/PRESERVATION OF CULTURAL HERITAGE PIECES AND PROCESS FOR PREPARING THE SAME

摘要

The invention relates to a photochemically stable antifungal wear-proof skid-proof composite to be used in museums and spaces for storage/preservation of cultural heritage pieces and to a process for preparing the same. According to the invention, the composite is based on polyurethane having an atomic mass of 5000 AMU and 3...7%, as related to the polyurethane mass, carborundum, as well as 9.4...9.5% hydroxyapatite having dimensions of 30...100 nm. The process, as claimed by the invention, consists in dissolving the resin in toluene solvent: 2-methyl-1-ol, followed by homogenization of the polymeric material, carborundum, and hydroxyapatite, by stirring continuously at a rotation speed of 250...300 rpm for 30...40 min while adding 0.4...0.6 g of diisocyanate /min as drops and stirring further for 70...90 min.