首页> 外国专利> MAGNETIC TUNNEL JUNCTION, MAGNETORESISTIVE RANDOM ACCESS MEMORY, CHIP, AND PREPARATION METHOD FOR MAGNETIC TUNNEL JUNCTION

MAGNETIC TUNNEL JUNCTION, MAGNETORESISTIVE RANDOM ACCESS MEMORY, CHIP, AND PREPARATION METHOD FOR MAGNETIC TUNNEL JUNCTION

机译:磁隧道结,磁阻随机存取存储器,芯片以及磁隧道结的制备方法

摘要

A preparation method for a magnetic tunnel junction (MTJ), and the MTJ and a magnetoresistive random access memory. The MTJ comprises: a fixed ferromagnetic layer (11), a free ferromagnetic layer (12), and a magnetic tunnel barrier (13) provided between the fixed ferromagnetic layer (11) and the free ferromagnetic layer (12); a side surface of the free ferromagnetic layer (12) and a surface opposite to the fixed ferromagnetic layer (11) is wrapped by means of the magnetic tunnel barrier (13), or, the magnetic tunnel barrier (13) covers a side surface of the fixed ferromagnetic layer (11) and a surface opposite to the free ferromagnetic layer (12), so that the free ferromagnetic layer (12) is more effectively separated from the fixed ferromagnetic layer (11), and the yield of the MTJ is improved. Furthermore, it is not necessary to form a vertical contour of the MTJ by using an ion or plasma etching method, the difficulty of preparation process is reduced, and the scalability of an MTJ array is improved.
机译:磁性隧道结(MTJ)的制备方法,MTJ和磁阻随机存取存储器。 MTJ包括:固定铁磁层(11),自由铁磁层(12)以及设置在固定铁磁层(11)和自由铁磁层(12)之间的磁隧道势垒(13)。自由铁磁层(12)的侧面和与固定铁磁层(11)相对的表面通过磁隧道势垒(13)包裹,或者磁隧道势垒(13)覆盖磁势垒(13)的侧面。固定铁磁层(11)和与自由铁磁层(12)相对的表面,使得自由铁磁层(12)与固定铁磁层(11)更有效地分离,从而提高了MTJ的产量。此外,不必通过使用离子或等离子体蚀刻方法来形成MTJ的垂直轮廓,降低了制备过程的难度,并且提高了MTJ阵列的可扩展性。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号