首页> 外国专利> SULFUR-DOPED REDUCED GRAPHENE OXIDE, MANUFACTURING METHOD THEREFOR, AND POLYIMIDE NANOCOMPOSITE CONTAINING SULFUR-DOPED REDUCED GRAPHENE OXIDE

SULFUR-DOPED REDUCED GRAPHENE OXIDE, MANUFACTURING METHOD THEREFOR, AND POLYIMIDE NANOCOMPOSITE CONTAINING SULFUR-DOPED REDUCED GRAPHENE OXIDE

机译:硫掺杂还原的氧化石墨烯,其制备方法以及包含硫掺杂还原的氧化石墨烯的聚酰亚胺纳米复合材料

摘要

Provided are: a sulfur-doped reduced graphene oxide comprising sulfur and reduced graphene oxide, wherein the D peak/ G peak intensity ratio obtained by Raman analysis of the sulfur-doped reduced graphene oxide is 1.03-1.31; a method for manufacturing the sulfur-doped reduced graphene oxide by using sulfur, or sulfur which is a byproduct generated in the process of petroleum refining; and a polyimide nanocomposite containing the sulfur-doped reduced graphene oxide. The sulfur-doped reduced graphene oxide manufactured according to the present invention does not require the use of a separate reductant or solvent during a reduction procedure, thereby achieving an effect of cost reduction. Furthermore, the present invention, compared with the prior art, can perform reduction and doping simultaneously and quickly through a simple method. The polyimide nanocomposite containing the above-described sulfur-doped reduced graphene oxide can be used to manufacture a film having gas diffusion barrier characteristics.
机译:提供:包含硫和还原石墨烯的硫掺杂还原石墨烯,其中,通过拉曼分析得到的所述硫掺杂还原石墨烯的D峰/ G峰强度比为1.03-1.31;一种通过使用硫或石油精制过程中产生的副产物硫制造硫掺杂的还原氧化石墨烯的方法;以及包含硫掺杂的还原氧化石墨烯的聚酰亚胺纳米复合材料。根据本发明制造的掺杂硫的还原的氧化石墨烯在还原过程中不需要使用单独的还原剂或溶剂,从而获得降低成本的效果。此外,与现有技术相比,本发明可以通过简单的方法同时且快速地进行还原和掺杂。包含上述硫掺杂的还原氧化石墨烯的聚酰亚胺纳米复合材料可以用于制造具有气体扩散阻挡特性的膜。

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