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SiGe INTELLIGENT SEMICONDUCTOR DEVICE HAVING SiGe QUANTUM WELL

机译:具有SiGe量子阱的SiGe智能半导体器件

摘要

The present invention relates to an intelligent semiconductor element which is configured to form a body region, in which a channel is formed, in a heterogeneous joint of different semiconductor layers and to form a quantum well on the semiconductor layer jointed to a drain. The intelligent semiconductor element stores a positive hole in the quantum well, imitates a short-term memory, and naturally imitates, at low power, that the short-term memory is changed to a long-term memory while the positive hole is accumulatively stored in the quantum well by continuous stimulus (pulse input) and then the positive hole is stored in a charge storage layer. Moreover, the intelligent semiconductor element can be manufactured as a bulk-type semiconductor substrate, and an existing CMOS technology can be utilized.
机译:智能半导体元件技术领域本发明涉及一种智能半导体元件,该智能半导体元件被配置为在不同半导体层的异质接合中形成在其中形成沟道的主体区域,并且在接合至漏极的半导体层上形成量子阱。智能半导体元件在量子阱中存储正空穴,模拟短期存储器,并且自然地以低功率模拟在将正空穴累积存储在其中的同时将短期存储器改变为长期存储器。通过连续激励(脉冲输入)将量子阱注入,然后将空穴存储在电荷存储层中。此外,可以将智能半导体元件制造为体型半导体衬底,并且可以利用现有的CMOS技术。

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