ELECTRON-BEAM IRRADIATION APPARATUS AND DYNAMIC FOCUS ADJUSTING METHOD OF ELECTRON-BEAM

摘要

The present invention relates to an electron beam irradiation device, comprising: an annular first electrode which is disposed downstream of a deflector along the optical axis of an electron beam and is in a magnetic field of an objective lens, and to which a positive first potential is variably applied; an annular second electrode in the magnetic field of the objective lens, disposed between the deflector and the first electrode, and applied with a positive second potential higher than the first potential; and an annular third electrode in the magnetic field of the objective lens, disposed opposite to the second electrode with respect to the first electrode, and applied with a third potential lower than the first potential.