首页> 外国专利> ITO Ti ITO Ti Ti METALIZING STRUCTURE FOR SKUTTERUDITE THERMOELECTRIC MATERIALS WITH ITO INTERLAYER Ti METALIZING METHOD SKUTTERUDITE THERMOELECTRIC MATERIALS WITH Ti METALIZING AND MANUFACTURING METHOD FOR THE SAME

ITO Ti ITO Ti Ti METALIZING STRUCTURE FOR SKUTTERUDITE THERMOELECTRIC MATERIALS WITH ITO INTERLAYER Ti METALIZING METHOD SKUTTERUDITE THERMOELECTRIC MATERIALS WITH Ti METALIZING AND MANUFACTURING METHOD FOR THE SAME

机译:ITO中间层Ti镀层的方钴矿热电材料的ITO Ti ITO Ti Ti的金属化结构及其制造方法

摘要

The present invention relates to a metallization method capable of improving the efficiency of a thermoelectric element by thinning a metal compound layer in applying a Ti metallization layer, an intermediate layer forming step of forming an ITO intermediate layer on the surface of a Ti foil; And it characterized in that it comprises a bonding step of forming a Ti metallization layer by bonding the Ti foil to the surface of the skirted tertite thermoelectric material such that the intermediate layer of ITO faces the surface of the skirted ruthetic thermoelectric material. The present invention has an effect of reducing the formation of an intermetallic compound formed by mutual diffusion of the sintering process by sintering the thermoelectric material powder after forming the ITO intermediate layer on the surface of the Ti foil. In addition, by reducing the intermetallic compound generated in the process of using for a long time at a high temperature by the ITO intermediate layer, there is an effect of increasing the economic efficiency by increasing the life of the thermoelectric element.
机译:本发明涉及一种金属化方法,该方法可以通过在施加Ti金属化层时使金属化合物层变薄来提高热电元件的效率,该中间层形成步骤是在Ti箔的表面上形成ITO中间层。并且其特征在于,其包括以下步骤:通过将Ti箔片粘合到裙状三方体热电材料的表面上以使得ITO的中间层面对裙状的钌热电材料的表面,从而形成Ti金属化层。本发明具有通过在Ti箔的表面上形成ITO中间层之后对热电材料粉末进行烧结来减少因烧结过程的相互扩散而形成的金属间化合物的形成的效果。另外,通过减少由ITO中间层在高温下长时间使用过程中产生的金属间化合物,具有通过增加热电元件的寿命来提高经济效率的效果。

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