SPUTTERING TARGET HAVING INCREASED LIFE AND SPUTTERING UNIFORMITY

摘要

A sputtering target for a sputtering chamber comprises a base plate having a sputtering plate mounted thereon. In one embodiment, the backing plate comprises a circular plate having a front surface including annular grooves. The sputtering plate includes a sputtering surface and a rear side having a circular ridge, and the circular ridge has a shape and size that is assembled into an annular groove of a base plate.