Projection exposure system with a tempered support structure and method for designing such

摘要

The invention relates to a projection exposure system (1) for semiconductor lithography, comprising projection optics (9), in turn at least one optical element (34), for which an optical axis (35) is defined and held by a temperature-controlled support structure (32), wherein at least one temperature field (40) of the tempered support structure (32) is formed perpendicular to the optical axis (35). Furthermore, the invention relates to a method for the design of such a tempered support structure (32).