APERTURE, OPTICAL SYSTEM AND LITHOGRAPHY SYSTEM

摘要

A diaphragm (300, 400), in particular a numerical aperture diaphragm, obscuration diaphragm, field diaphragm, stray light diaphragm or false light diaphragm, for a lithography system (100A, 100B), having a light-determining edge (310, 410), which has an outer contour (312) or a diaphragm opening (412 ) the diaphragm (300, 400) defines, and an edge area (306, 406) on which the light-determining edge (310, 410) is provided, the edge area (306, 406) being shaped such that when the diaphragm is tilted (300, 400) around a tilt axis (302, 402) a cross-sectional area (A) shaded by the diaphragm (300, 400) remains constant.