PROCESS, OPTICAL ELEMENT, OPTICAL SYSTEM AND LITHOGRAPHY SYSTEM

摘要

A method for processing an optical element (202) for a lithography system (100A, 100B), comprising the steps: a) determining (S1) a local curve (216) of the coefficient of thermal expansion (α) of a substrate (204) of the optical element (202 ); and b) local irradiation (S3) of the substrate (204) with particles (222), in particular with electrons, for changing the local profile (216) of the coefficient of thermal expansion (α).