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Characterization of Thin Silicon Oxynitride Films Prepared by Low Pressure Rapid Thermal Chemical Vapor Deposition

机译：低压快速热化学气相沉积制备薄硅氮氧化物薄膜的表征

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X. -l. Xu; P. K. Mclarty; H. Brush; V. Misra; J. J. Wortman; G. S. Harris;
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Characterization of Thin Silicon Oxynitride Films Prepared by Low Pressure Rapid Thermal Chemical Vapor Deposition

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