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Brass smelting dust as a source of ZnO in the production of targets used in magnetron sputtering thin film deposition

机译:在磁控溅射薄膜沉积中使用的靶材生产中,黄铜冶炼粉尘作为ZnO的来源

摘要

The feasibility of using a zinc oxide rich waste (ZnO>95%), dust originated in the brasssmelting industrial process, as a raw material to produce targets to be used in radiofrequencymagnetron sputtering (RFMS) deposition of ZnO thin films was investigated.The ZnO waste was characterized in terms of chemical and mineralogical compositionsand particle size distribution. The targets were prepared by uniaxial pressing of the ZnOwaste followed by sintering in air at a temperature in the range 900-1200 ºC. The densityof sintered targets increased with sintering temperature, and zincite (ZnO) was thepredominant crystalline phase identified by X-ray diffraction (XRD). Scanning electronmicroscopy (SEM) revealed zincite grains, with an average size ~2 m and a nonhomogeneousmicrostructure due to the presence of dense aggregates. Preliminary MSthin film deposition tests on a glass substrate produced transparent nanostructured ZnOthin films with a homogeneous microstructure. Research work is underway to processZnO waste-based targets with an improved microstructure in order to obtain RFMSdeposited ZnO thin films with optimized final electrical and optical properties.
机译:研究了使用富含氧化锌的废料(ZnO> 95%)(来自黄铜冶炼工业过程中的粉尘)作为生产靶材的可行性,该靶材可用于射频磁控溅射(RFMS)沉积ZnO薄膜。根据化学和矿物组成以及粒度分布对废物进行了表征。通过单轴压制ZnO废料,然后在900-1200ºC的温度下在空气中烧结来制备靶材。烧结靶的密度随烧结温度的增加而增加,锌矿(ZnO)是通过X射线衍射(XRD)鉴定的主要晶相。扫描电子显微镜(SEM)显示锌矿晶粒,由于存在密集的聚集体,平均粒径约为2μm,并且组织不均匀。在玻璃基板上进行的初步MSthin薄膜沉积测试产生了具有均匀微观结构的透明纳米结构ZnOthin薄膜。为了获得具有最佳最终电学和光学性能的RFMS沉积的ZnO薄膜,正在进行研究以加工具有改善的微观结构的基于ZnO废物的靶材。

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