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Fine structure of the red luminescence band in undoped GaN

机译:未掺杂GaN中红色发光带的精细结构

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摘要

Many point defects in GaN responsible for broad photoluminescence (PL) bands remain unidentified. Their presence in thick GaN layers grown by hydride vapor phase epitaxy (HVPE) detrimentally affects the material quality and may hinder the use of GaN in high-power electronic devices. One of the main PL bands in HVPE-grown GaN is the red luminescence (RL) band with a maximum at 1.8 eV. We observed the fine structure of this band with a zero-phonon line (ZPL) at 2.36 eV, which may help to identify the related defect. The shift of the ZPL with excitation intensity and the temperature-related transformation of the RL band fine structure indicate that the RL band is caused by transitions from a shallow donor (at low temperature) or from the conduction band (above 50 K) to an unknown deep acceptor having an energy level 1.130 eV above the valence band.
机译:GaN中负责宽泛光致发光(PL)波段的许多点缺陷仍未发现。它们在氢化物气相外延(HVPE)生长的厚GaN层中的存在会不利地影响材料质量,并可能阻碍GaN在大功率电子设备中的使用。 HVPE生长的GaN中的主要PL波段之一是最大1.8 eV的红色发光(RL)波段。我们用2.36 eV的零声子线(ZPL)观察了该频带的精细结构,这可能有助于识别相关缺陷。 ZPL随激发强度的变化以及RL带精细结构的温度相关转换表明RL带是由从浅施主(在低温下)或从导带(在50 K以上)到硅的跃迁引起的。能级比价带高1.130 eV的未知深受体。

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