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Enhancement of phase separation in the InGaN layer for self-assembled In-rich quantum dots

机译:自组装富In量子点的InGaN层中相分离的增强

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摘要

The enhancement of phase separation in the InGaN layer grown on a GaN layer with a rough surface was investigated for the formation of self-assembled In-rich quantum dots(QDs) in the InGaN layer. Transmission electron microscopy images showed that In-rich QDs with a size of 2–5 nm were formed even in an InGaN layer with a low indium content, and a layer thickness less than the critical thickness. The room-temperature photoluminescence(PL) spectrum of this layer showed emission peaks corresponding to In-rich QDs. The temperature-dependent PL spectra showed dominant peak shifts to the lower energy side, indicating that the self-assembled In-rich QDs are formed in the InGaN layer grown on a rough GaNsurface and that the carriers are localized in In-rich QDs.
机译:为了在InGaN层中形成自组装的富In量子点(QD),研究了在具有粗糙表面的GaN层上生长的InGaN层中相分离的增强。透射电子显微镜图像显示,即使在铟含量低且层厚度小于临界厚度的InGaN层中,也形成了大小为2-5 nm的富In量子点。该层的室温光致发光(PL)光谱显示出与In-rich QDs相对应的发射峰。随温度变化的PL光谱显示出向较低能级的主要峰移,表明在粗糙GaN表面上生长的InGaN层中形成了自组装的In-rich QDs,并且载流子位于In-rich QDs中。

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