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Bottom up Approach: An Efficient Fabrication of CeO2 Thin Films for High Performance Resistive Random Access Memories

机译:自下而上的方法:用于高性能电阻随机存取存储器的CeO2薄膜的高效制造

摘要

Resistive random access memories (RRAMs) based on metal oxide thin films have unique advantages over conventional non-volatile memories. In particular, RRAM exhibits two resistances states that can be switched by an external bias and this process is referred as resistive switching process. The resistive switching processes in metal oxides are usually limited to a small region near the interfaces, therefore the understanding of the interfaces and growth of nanometre scale oxide films are extremely desirable. Meanwhile, there is a barrier that the current top-down approaches for making nanoscale features are prohibitively costly and complicated. Therefore, this dissertation will focus on the development of bottom up approaches for improved resistive switching performances via materials design, defect and interface engineering.In this dissertation, cerium oxide (CeO2) has been selected as the resistive switching material and solution processed thin film deposition technologies have been deployed for controlling the morphology and tuning the resistive switching properties. For instance, CeO2-ZnO nanocomposite exhibited an increment of 100 times in RON/ROFF ratio as compared to electrodeposited CeO2 polycrystalline thin films. Additionally, high RON/ROFF ratio (>104) with excellent uniformity was achieved by using interface engineered CeO2 nanocubes based thin films. The degree of self-assembly was also proven to be critical to improve the resistive switching behavior of CeO2 nanocubes in terms of shorter switching response time with high uniformity in switching characteristics. Furthermore, doping effects on the resistive switching properties has been studied via estimation of switching probabilities at low biasing conditions. Finally, a stepwise quantized conductance behavior was observed in the CeO2 based nanocomposite (SnO2-CeO2) films which later on were attributed to the formation and disruption of atomic scale conducting filaments. This dissertation demonstrated the great potential of bottom up technology to fabricate novel RRAM devices. Also, the performance of the resistive switching devices reported in these studies were comparable to those fabricated by high cost, complex and sophisticated top-down techniques. This approach may also provide a new research direction towards developing multifunctional novel nanoelectronics
机译:与传统的非易失性存储器相比,基于金属氧化物薄膜的电阻式随机存取存储器(RRAM)具有独特的优势。特别地,RRAM表现出可以通过外部偏置来切换的两个电阻状态,该过程称为电阻切换过程。金属氧化物中的电阻转换过程通常限于界面附近的小区域,因此,非常需要了解界面和纳米级氧化膜的生长。同时,存在一个障碍,即用于制造纳米级特征的当前的自顶向下方法过于昂贵且复杂。因此,本文将重点研究通过材料设计,缺陷和界面工程来改善电阻开关性能的自底向上方法。本文选择氧化铈(CeO2)作为电阻开关材料和溶液处理的薄膜沉积已经采用了多种技术来控制形态和调整电阻开关特性。例如,与电沉积的CeO2多晶薄膜相比,CeO2-ZnO纳米复合材料的RON / ROFF比增加了100倍。此外,通过使用基于界面工程的CeO2纳米立方体基薄膜,可以实现具有良好均匀性的高RON / ROFF比(> 104)。还证明了自组装程度对于提高CeO2纳米立方体的电阻开关性能至关重要,因为它具有更短的开关响应时间和更高的开关特性均匀性。此外,已经通过估计低偏置条件下的开关概率来研究掺杂对电阻开关特性的影响。最后,在基于CeO2的纳米复合材料(SnO2-CeO2)薄膜中观察到逐步量化的电导行为,其后归因于原子级导电丝的形成和破坏。本文证明了自底向上技术在制造新型RRAM器件方面的巨大潜力。而且,这些研究中报告的电阻式开关器件的性能可与通过高成本,复杂而复杂的自上而下技术制造的电阻开关器件相媲美。这种方法也可能为开发多功能新型纳米电子学提供新的研究方向。

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